DocumentCode
818749
Title
A New High Intensity K-Beam at the Bevatron
Author
Leemann, C. ; Morgado, R. ; Sah, R.
Author_Institution
Lawrence Berkeley Laboratory University of California Berkeley, California
Volume
22
Issue
3
fYear
1975
fDate
6/1/1975 12:00:00 AM
Firstpage
1484
Lastpage
1487
Abstract
A new high-intensity K-beam has been installed at the Bevatron. The design goal was 2.2 x 105 K+ s per machine pulse at 500 MeV/c, 7.4 à 104 stopped K+ s, and less than 106¿ contamination. Large horizontal acceptance (± 210 mrad), short length (~ 10 m) and two stages of separation are the most prominent features of the design. The observed optical properties are in reasonable agreement with the calculations. An evaluation of the performance of this beam is presented.
Keywords
Apertures; Electrodes; Hardware; Magnetic fields; Magnetic separation; Particle beams; Particle separators; Protons; Steel; Voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1975.4327915
Filename
4327915
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