DocumentCode
819984
Title
Hardness and etching studies on flux grown YFeO3 crystals
Author
Bamzai, Krishen Kumar ; Kotru, P.N. ; Wanklyn, B.M.
Author_Institution
Dept. of Phys., Jammu Univ., India
Volume
28
Issue
5
fYear
1992
fDate
9/1/1992 12:00:00 AM
Firstpage
2353
Lastpage
2355
Abstract
Results of Vicker´s microhardness (H v), fracture toughness (K c), brittleness (B i), and dislocation etching characteristics on (110) and (001) planes of flux grown yttrium orthoferrite crystals are reported. The values of H v, K c, B i are estimated to be 1235.08 Kg/mm2, 0.1912 gm/μm3/2, and 8.1955 μm-1/2, respectively, for (110) plane, whereas for (001) plane the values of H v, K c, and B i are 1027.12 kg/mm2, 0.5975 gm/μm3/2, and 1.875 μm-1/2, respectively. The variation o H v with applied load is explained to follow from the Hays and Kendalls law. Etching kinetics of YFeO3 surfaces in H3PO4 at different temperatures leads to activation energy values for etch pits; the activation energies for dissolution parallel to (110) and (001) planes (i.e., lateral dissolution E L) are 0.41 eV and 0.34 eV, respectively. The activation energies for dissolution perpendicular to (110) and (001) planes (i.e., vertical dissolution E D) are 0.20 eV and 0.21 eV, respectively
Keywords
brittleness; crystal growth from solution; dislocation etching; ferrites; fracture toughness; hardness; yttrium compounds; (001) planes; (110) plane; Vicker´s microhardness; activation energy values; brittleness; dislocation etching; etch pits; flux grown YFeO3; fracture toughness; lateral dissolution; orthoferrite; Bismuth; Crystalline materials; Crystals; Electrical resistance measurement; Equations; Etching; Plastics; Pressure measurement; Stress measurement;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.179489
Filename
179489
Link To Document