• DocumentCode
    819984
  • Title

    Hardness and etching studies on flux grown YFeO3 crystals

  • Author

    Bamzai, Krishen Kumar ; Kotru, P.N. ; Wanklyn, B.M.

  • Author_Institution
    Dept. of Phys., Jammu Univ., India
  • Volume
    28
  • Issue
    5
  • fYear
    1992
  • fDate
    9/1/1992 12:00:00 AM
  • Firstpage
    2353
  • Lastpage
    2355
  • Abstract
    Results of Vicker´s microhardness (Hv), fracture toughness (Kc), brittleness (Bi), and dislocation etching characteristics on (110) and (001) planes of flux grown yttrium orthoferrite crystals are reported. The values of Hv, Kc, Bi are estimated to be 1235.08 Kg/mm2, 0.1912 gm/μm3/2, and 8.1955 μm-1/2, respectively, for (110) plane, whereas for (001) plane the values of Hv, Kc, and Bi are 1027.12 kg/mm2, 0.5975 gm/μm3/2, and 1.875 μm-1/2, respectively. The variation o Hv with applied load is explained to follow from the Hays and Kendalls law. Etching kinetics of YFeO3 surfaces in H3PO4 at different temperatures leads to activation energy values for etch pits; the activation energies for dissolution parallel to (110) and (001) planes (i.e., lateral dissolution EL) are 0.41 eV and 0.34 eV, respectively. The activation energies for dissolution perpendicular to (110) and (001) planes (i.e., vertical dissolution ED) are 0.20 eV and 0.21 eV, respectively
  • Keywords
    brittleness; crystal growth from solution; dislocation etching; ferrites; fracture toughness; hardness; yttrium compounds; (001) planes; (110) plane; Vicker´s microhardness; activation energy values; brittleness; dislocation etching; etch pits; flux grown YFeO3; fracture toughness; lateral dissolution; orthoferrite; Bismuth; Crystalline materials; Crystals; Electrical resistance measurement; Equations; Etching; Plastics; Pressure measurement; Stress measurement;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.179489
  • Filename
    179489