Title :
Design and Application of Compact and Highly Tolerant Polarization-Independent Waveguides
Author :
Wörhoff, Kerstin ; Roeloffzen, Chris G H ; De Ridder, René M. ; Driessen, Alfred ; Lambeck, Paul V.
Author_Institution :
Twente Univ., Enschede
fDate :
5/1/2007 12:00:00 AM
Abstract :
In this paper, the design, fabrication, and application of a highly tolerant polarization-independent optical-waveguide structure suited for operation in the third communication window is presented. The waveguide structure has been optimized toward minimized sensitivity to technological tolerances and low fabrication complexity. The tolerance analysis has been based on the typical processing tolerances of the widely applied silicon-oxynitride technology, being plusmn3times10 -4 in refractive index, plusmn1% in thickness, and plusmn0.1 mum in channel width. The optimized waveguide design fulfills the criterion of a channel birefringence within 5times10-5, including processing tolerance. It also enables a fiber-to-chip coupling loss below 1 dB/facet and is suited for the realization of low-loss bends with a radius down to 600 mum. Based on this waveguide design, a passband-flattened optical wavelength filter with 50-GHz free spectral range has been realized and tested. The measured TE-TM shift of 0.03 nm confirms the polarization dependence of the optical waveguides being as low as 3times10-5
Keywords :
birefringence; integrated optics; light polarisation; optical communication equipment; optical design techniques; optical fabrication; optical filters; optical waveguides; refractive index; birefringence; fiber-to-chip coupling loss; optical wavelength filter; polarization-independent waveguides; refractive index; tolerance analysis; Optical design; Optical device fabrication; Optical filters; Optical polarization; Optical refraction; Optical sensors; Optical variables control; Optical waveguides; Refractive index; Tolerance analysis; Adiabatic bend; optical filter; polarization-independent waveguide (PIW); silicon oxynitride; tolerance analysis;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2007.893041