Title :
Microstructural investigations of FeN and FeAlN thin films for recording head applications
Author :
Rogers, D.J. ; Wang, S. ; Laughlin, D.E. ; Kryder, M.H.
Author_Institution :
Data Storage Syst. Center, Carnegie Mellon Univ., Pittsburgh, PA, USA
fDate :
9/1/1992 12:00:00 AM
Abstract :
A series of FeN and FeAlN thin films were grown by reactive RF sputter deposition. Planar and cross-sectional specimens were investigated in the transmission electron microscope (TEM). It is observed that introduction of nitrogen is associated with improved magnetic properties and decreased grain size. and that the introduction of Al is associated with improved thermal stability of both the magnetic properties and the microstructures. The authors also investigated the effect of lamination and the role of the interlayer. They found the best magnetic properties in annealed films with five 1000-Å-thick FeN layers and four 25-Å-thick SiO2 interlayers. High-resolution TEM studies of cross-sectional specimens revealed an amorphous structure in this interlayer, providing crystallographic decoupling between the FeN layers. It is proposed that this SiO2 layer also serves to reduce magnetic coupling between layers
Keywords :
aluminium compounds; crystal microstructure; ferromagnetic properties of substances; grain size; iron compounds; magnetic heads; magnetic multilayers; sputtered coatings; transmission electron microscope examination of materials; FeAlN films; FeN films; SiO2 interlayers; TEM studies; annealed films; cross-sectional specimens; crystallographic decoupling; effect of lamination; grain size; magnetic coupling; magnetic properties; magnetic thin films; microstructures; multilayers; reactive RF sputter deposition; recording head; thermal stability; Grain size; Lamination; Magnetic properties; Microstructure; Nitrogen; Radio frequency; Sputtering; Thermal stability; Transistors; Transmission electron microscopy;
Journal_Title :
Magnetics, IEEE Transactions on
