In-plane anisotropy studies in amorphous FeBSi films

Author

Krishnan, R. ; Tessier, M. ; Contreras, M.C. ; Iglesias, I.

Author_Institution

Lab. de Magnetisme et Materiaux Magnetiques, CNRS, Meudon, France

Volume

Issue

fYear

1992

fDate

9/1/1992 12:00:00 AM

Firstpage

2427

Lastpage

2429

Abstract

Uniaxial anisotropy field H_k and local anisotropy fluctuation represented as magnetic ripple, S were studied as a function of argon pressure during deposition for the RF sputtered amorphous FeBSi films. The influence of P_Ar on H_k, K_loc, and S (structure constant) is discussed. The magnitude of S and K_locd^3/2 were found to be strongly dependent on P_Ar

Keywords

boron alloys; ferromagnetic properties of substances; iron alloys; magnetic anisotropy; magnetic properties of amorphous substances; magnetic thin films; silicon alloys; sputtered coatings; RF sputtered; amorphous FeBSi films; deposition; in-plane anisotropy; local anisotropy fluctuation; magnetic ripple; magnetic thin films; metallic glass; uniaxial anisotropy; Amorphous magnetic materials; Amorphous materials; Anisotropic magnetoresistance; Argon; Fluctuations; Lab-on-a-chip; Magnetic anisotropy; Magnetic films; Perpendicular magnetic anisotropy; Radio frequency;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.179514

Filename

179514

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=820302