Title :
In-plane anisotropy studies in amorphous FeBSi films
Author :
Krishnan, R. ; Tessier, M. ; Contreras, M.C. ; Iglesias, I.
Author_Institution :
Lab. de Magnetisme et Materiaux Magnetiques, CNRS, Meudon, France
fDate :
9/1/1992 12:00:00 AM
Abstract :
Uniaxial anisotropy field Hk and local anisotropy fluctuation represented as magnetic ripple, S were studied as a function of argon pressure during deposition for the RF sputtered amorphous FeBSi films. The influence of PAr on Hk, Kloc , and S (structure constant) is discussed. The magnitude of S and Klocd3/2 were found to be strongly dependent on PAr
Keywords :
boron alloys; ferromagnetic properties of substances; iron alloys; magnetic anisotropy; magnetic properties of amorphous substances; magnetic thin films; silicon alloys; sputtered coatings; RF sputtered; amorphous FeBSi films; deposition; in-plane anisotropy; local anisotropy fluctuation; magnetic ripple; magnetic thin films; metallic glass; uniaxial anisotropy; Amorphous magnetic materials; Amorphous materials; Anisotropic magnetoresistance; Argon; Fluctuations; Lab-on-a-chip; Magnetic anisotropy; Magnetic films; Perpendicular magnetic anisotropy; Radio frequency;
Journal_Title :
Magnetics, IEEE Transactions on
