Title :
Mossbauer effect study of ordering in Fe-Al-Si and Fe-Al-Si-Ni magnetic thin films
Author :
Miyazaki, Masahiro ; Ichikawa, Masashi ; Komatsu, Takayuki ; Matusita, Kazumasa
Author_Institution :
Dept. of Chem., Nagaoka Univ. of Technol., Niigata, Japan
fDate :
9/1/1992 12:00:00 AM
Abstract :
Fe-Al-Si and Fe-Al-Si-Ni magnetic films with a thickness of 1 μm were deposited on crystallized-glass substrates by RF planar magnetron sputtering, and the changes in magnetic properties and microscopic structural changes in the films due to annealing were investigated. The films annealed at 500°C exhibited excellent soft magnetic properties for recording head materials. Fe-Al-Si-Ni films with high saturation magnetic-flux densities of 14.8 kG were obtained. Conversion electron Mossbauer spectroscopy showed that the disordered structure of α-type in as-sputtered films transformed into the ordered structure consisting of a mixture of B2- and DO3-types at a temperature of 500°C
Keywords :
Mossbauer effect; aluminium alloys; annealing; coercive force; crystal atomic structure of alloys; ferromagnetic properties of substances; iron alloys; magnetic permeability; magnetic thin films; nickel alloys; silicon alloys; sputtered coatings; 14.8 kG; 500 C; Fe-Al-Si; Fe-Al-Si-Ni; Mossbauer effect; RF planar magnetron sputtering; annealing; coercive force; crystallized-glass substrates; disordered structure; effective permeability; high saturation magnetic-flux densities; magnetic thin films; microscopic structural changes; ordered structure; recording head materials; sendust; soft magnetic properties; Annealing; Crystallization; Magnetic films; Magnetic force microscopy; Magnetic materials; Magnetic properties; Radio frequency; Saturation magnetization; Soft magnetic materials; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
