Title :
Analysis of Tunable Internal Loss Caused by Franz–Keldysh Absorption in Transistor Lasers
Author :
Hsiao-Lun Wang ; Yu-Hao Huang ; Gong-Sheng Cheng ; Shu-Wei Chang ; Chao-Hsin Wu
Author_Institution :
Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
The Franz-Keldysh (FK) absorption at the base-collector junction of a transistor laser (TL) is inevitable because of the reverse bias therein. The bias condition, thus, plays a crucial role in the determination of internal loss of TLs. In this study, effects from various facet coatings of edge-emitting TLs on the internal loss(αint), which is influenced by the FK absorption, are investigated. Experimental analyses on the electrical and optical characteristics of these TLs at various temperatures are presented. The αint of different coated devices at various bias voltages are then extracted from their light-versus-current curves. We demonstrate that the internal loss resulted from the FK absorption is bias dependent, and therefore tunable. By contrast, the intense field inside the cavity with highly reflective coatings on both facets may saturate the FK absorption and make it less bias controllable.
Keywords :
laser cavity resonators; laser tuning; optical losses; Franz-Keldysh absorption; base-collector junction; edge-emitting transistor laser; electrical characteristics; facet coatings; light-versus-current curves; optical characteristics; reflective coatings; reverse bias; tunable internal loss; Absorption; Cavity resonators; Coatings; Integrated optics; Optical amplifiers; Optical devices; Photonics; Franz–Keldysh absorption; Franz???Keldysh absorption; Transistor laser; laser internal loss;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2015.2438814