Title :
Preparation of soft magnetic Fe-N films by ion beam deposition method with strict control of plasma potential
Author :
Nakagawa, Shigeki ; Hamaguchi, Takehiko ; Naoe, Masahiko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
9/1/1992 12:00:00 AM
Abstract :
An ion beam deposition apparatus with the facing targets type of ion source (FTIS) was used to deposit ion species with proper kinetic energy and particularly to prepare soft magnetic Fe-N films. The coercivity was varied by strict control of the nitration degree of Fe-N films by adjusting the NH3 partial pressure. The H c and the relative permeability μr could be controlled by adjusting the plasma potential Vp. Further improvement of soft magnetic properties of the films, such as decrease of Hc and increase of μr, has been attained by a post-annealing process. For example, Fe-N films prepared at PNH3 of 8 mPa and Vp of 45 V and postannealed at 150°C exhibited 4 πMs, Hc, and μr of 19 kG, 2 Oe, and 2000, respectively. Consequently, the Fe-N films prepared by FTIS may be useful as the magnetic core layer for a thin-film-type recording head with high performance
Keywords :
annealing; coercive force; ferromagnetic properties of substances; iron alloys; magnetic hysteresis; magnetic permeability; magnetic thin films; sputter deposition; sputtered coatings; coercivity; facing targets ion source; film preparation; ion beam deposition method; magnetic core layer; plasma potential; post-annealing; relative permeability; soft magnetic Fe-N films; soft magnetic properties; thin-film-type recording head; Coercive force; Ion beams; Ion sources; Kinetic energy; Magnetic films; Magnetic properties; Permeability; Plasma properties; Pressure control; Soft magnetic materials;
Journal_Title :
Magnetics, IEEE Transactions on
