DocumentCode
823061
Title
Radiation Tolerance of Amorphous Semiconductors
Author
Nicolaides, R.Vogel ; DeFeo, S. ; Doremus, L.W.
Volume
23
Issue
1
fYear
1976
Firstpage
839
Lastpage
848
Abstract
In an attempt to determine the threshold radiation damage in amorphous semiconductors, radiation tests were performed on amorphous semiconductor thin film materials and on threshold and memory devices. The influence of flash x-rays and neutron radiation upon the switching voltages, on- and off-state characteristics, dielectric response, optical transmission, absorption band edge and photoconductivity were measured prior to, during and following irradiation. These extensive tests showed the high radiation tolerance of amorphous semiconductor materials. Electrical and optical properties, other than photoconductivity, have a neutron radiation tolerance threshold above 1017 nvt in the steady state and 1014 nvt in short (50 ¿sec to 16 msec) pulses. Photoconductivity increases by 1¿ orders of magnitude at the level of 1014 nvt (short pulses of 50 ¿sec). Super flash x-rays up to 5000 rads (Si), 20 nsec, do not initiate switching in off-state samples which are voltage biased up to 90% of the threshold voltage. Both memory and threshold amorphous devices are capable of switching on and off during nuclear radiation transients at least as high as 2 à 1014 nvt in 50 ¿sec pulses.
Keywords
Amorphous semiconductors; Dielectric materials; Dielectric thin films; Materials testing; Optical materials; Photoconducting materials; Photoconductivity; Semiconductor device testing; Semiconductor materials; X-rays;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1976.4328353
Filename
4328353
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