• DocumentCode
    824
  • Title

    Ultrabroadband and Wide-Angle Hybrid Antireflection Coatings With Nanostructures

  • Author

    Perl, Emmett E. ; Chieh-Ting Lin ; McMahon, William E. ; Friedman, Daniel J. ; Bowers, John E.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California at Santa Barbara, Santa Barbara, CA, USA
  • Volume
    4
  • Issue
    3
  • fYear
    2014
  • fDate
    May-14
  • Firstpage
    962
  • Lastpage
    967
  • Abstract
    Ultrabroadband and wide-angle antireflection coatings (ARCs) are essential to realizing efficiency gains for state-of-the-art multijunction photovoltaic devices. In this study, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce reflected AM1.5D power by 10-50 W/m2 over a wide angular range compared to conventional thin-film ARCs. A detailed balance model correlates this to an improvement in absolute cell efficiency of 1-2%. Three different ARC designs are fabricated on indium gallium phosphide, and reflectance is measured to show the benefit of this hybrid approach.
  • Keywords
    antireflection coatings; infrared spectra; multilayers; nanofabrication; nanostructured materials; solar cells; ultraviolet spectra; visible spectra; AM1.5D power; TiO2-SiO2; cell efficiency; multilayer ARC; nanostructured materials; optical models; state-of-the-art multijunction photovoltaic devices; ultrabroadband antireflection coatings; wide-angle hybrid antireflection coatings; Coatings; Computer architecture; Junctions; Nanostructures; Nonhomogeneous media; Optical refraction; Photonic band gap; Biomimetics; III–V semiconductor materials; optical films; photovoltaic cells;
  • fLanguage
    English
  • Journal_Title
    Photovoltaics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    2156-3381
  • Type

    jour

  • DOI
    10.1109/JPHOTOV.2014.2304359
  • Filename
    6746652