Title : 
Ultrabroadband and Wide-Angle Hybrid Antireflection Coatings With Nanostructures
         
        
            Author : 
Perl, Emmett E. ; Chieh-Ting Lin ; McMahon, William E. ; Friedman, Daniel J. ; Bowers, John E.
         
        
            Author_Institution : 
Dept. of Electr. & Comput. Eng., Univ. of California at Santa Barbara, Santa Barbara, CA, USA
         
        
        
        
        
        
        
        
            Abstract : 
Ultrabroadband and wide-angle antireflection coatings (ARCs) are essential to realizing efficiency gains for state-of-the-art multijunction photovoltaic devices. In this study, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce reflected AM1.5D power by 10-50 W/m2 over a wide angular range compared to conventional thin-film ARCs. A detailed balance model correlates this to an improvement in absolute cell efficiency of 1-2%. Three different ARC designs are fabricated on indium gallium phosphide, and reflectance is measured to show the benefit of this hybrid approach.
         
        
            Keywords : 
antireflection coatings; infrared spectra; multilayers; nanofabrication; nanostructured materials; solar cells; ultraviolet spectra; visible spectra; AM1.5D power; TiO2-SiO2; cell efficiency; multilayer ARC; nanostructured materials; optical models; state-of-the-art multijunction photovoltaic devices; ultrabroadband antireflection coatings; wide-angle hybrid antireflection coatings; Coatings; Computer architecture; Junctions; Nanostructures; Nonhomogeneous media; Optical refraction; Photonic band gap; Biomimetics; III–V semiconductor materials; optical films; photovoltaic cells;
         
        
        
            Journal_Title : 
Photovoltaics, IEEE Journal of
         
        
        
        
        
            DOI : 
10.1109/JPHOTOV.2014.2304359