DocumentCode
824891
Title
2.4 μm cutoff wavelength avalanche photodiode on InP substrate
Author
Sidhu, R. ; Zhang, L. ; Tan, N. ; Duan, N. ; Campbell, J.C. ; Holmes, A.L., Jr. ; Hsu, C.-F. ; Itzler, M.A.
Author_Institution
Electr. & Comput. Eng. Dept., Univ. of Texas, Austin, TX, USA
Volume
42
Issue
3
fYear
2006
Firstpage
181
Lastpage
182
Abstract
An InP-based avalanche photodiode with a cutoff wavelength of 2.4 μm is reported. Type-II GaInAs-GaAsSb quantum wells lattice-matched to InP were used in the absorption region of the photodiode for long-wavelength absorption. The device exhibited multiplication gain in excess of 30 at room temperature and in excess of 200 at 225 Kelvin with dark current density near breakdown of less than 0.66 mA/cm2.
Keywords
III-V semiconductors; avalanche photodiodes; current density; gallium arsenide; gallium compounds; indium compounds; photoconductivity; semiconductor device breakdown; semiconductor quantum wells; 2.4 micron; GaInAs-GaAsSb; GaInAs-GaAsSb quantum wells; avalanche photodiode; cutoff wavelength; dark current density; long-wavelength absorption; multiplication gain; semiconductor device breakdown;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20063415
Filename
1593316
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