DocumentCode
825590
Title
Strain and interfacial bond type effects on structural quality of InAs/Ga(As,Sb) superlattices grown on InAs substrates
Author
Sarney, W.L. ; Leavitt, R.P.
Author_Institution
US Army Res. Lab., Adelphi, MD, USA
Volume
150
Issue
4
fYear
2003
Firstpage
415
Lastpage
419
Abstract
A series of InAs/Ga(As,Sb) superlattices were grown on InAs substrates by molecular beam epitaxy. The samples were grown in a manner that allowed the nature of the interfacial bonds (either GaAs or In(As,Sb)-like) to be controlled). In some of the samples the bond type-related strain was accommodated by adjusting the Sb mole fraction to nearly lattice match the superlattice to the substrate regardless of bond configuration. High-resolution X-ray diffraction measurements and transmission electron microscopy images reveal that samples grown with In(As,Sb)-like bonds on top of the InAs layers exhibit superior structural quality. Samples with GaAs-like bonds at both interfaces are far inferior to the others.
Keywords
III-V semiconductors; X-ray diffraction; bonds (chemical); gallium arsenide; gallium compounds; indium compounds; interface structure; molecular beam epitaxial growth; semiconductor growth; semiconductor superlattices; transmission electron microscopy; GaAs-like bonds; In(As,Sb)-like bonds; InAs; InAs substrates; InAs-GaAsSb; InAs/Ga(As,Sb) superlattices; Sb mole fraction; TEM images; bond configuration; bond type-related strain; high-resolution X-ray diffraction; interfacial bond type effects; interfacial bonds; lattice matching; molecular beam epitaxy; structural quality; transmission electron microscopy;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20030408
Filename
1245009
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