Title :
High power InGaAs-GaAs-InGaP buried heterostructure strained quantum well lasers grown by two step MOVPE
Author :
Sin, Y.K. ; Horikawa, H. ; Kamijoh, T.
Author_Institution :
Oki Electr. Ind. Co. Ltd., Tokyo, Japan
Abstract :
Data are presented on device results from buried heterostructure InGaAs-GaAs strained quantum well lasers with In0.49Ga0.51P cladding layers ( lambda L=980 nm). AR-HR coated buried heterostructure lasers with a p-n InGaP current blocking junction show low laser thresholds of 3.1 mA and high output powers of 95 mW both measured CW at RT. This is the first demonstration of InGaAs-GaAs-InGaP buried heterostructure lasers entirely grown by a two step MOVPE process.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; semiconductor lasers; vapour phase epitaxial growth; 3.1 mA; 95 mW; 980 nm; In 0.49Ga 0.51P cladding layers; InGaAs-GaAs-InGaP; buried heterostructure strained quantum well lasers; current blocking junction; laser thresholds; output powers; two step MOVPE;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19930165