Title :
High Performance Radiation Hard CMOS/SOS Technology
Author :
Yuan, J.H. ; Harari, E.
Author_Institution :
Newport Beach Research Center Hughes Aircraft Company 500 Superior Avenue Newport Beach, California 92663
Abstract :
This paper describes the ionizing radiation effects on Si-gate CMOS/SOS short channel devices having channel lengths ranging from 1.8¿m to 3.8¿m. These short channel CMOS/SOS devices exhibit very high speed performance; the 1.8¿m channel length devices achieve a propagation delay time of 0.19 ns at 10V and 0.26 ns at 5V while the 2.8¿m channel length devices achieve a propagation delay time of 0.41 ns at 10V and 0.71 ns at 5V. Post-radiation n-channel back leakages of ¿0.1¿a/mil of channel width and threshold voltage shifts of ¿ 1V for both n and p-channel devices were obtained after 106 rads (Si) on the 2.8¿m channel length devices.
Keywords :
Aircraft; CMOS logic circuits; CMOS process; CMOS technology; Doping; Ionizing radiation; Metallization; Propagation delay; Radiation effects; Threshold voltage;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.1977.4329192