DocumentCode :
832555
Title :
Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( 
-C:F) on Spherical Surfaces
Author :
Biloiu, Costel ; Sakai, Yosuke
Author_Institution :
Varian Semicond. Equip. Assoc., Gloucester, MA
Volume :
36
Issue :
4
fYear :
2008
Firstpage :
890
Lastpage :
891
Abstract :
An RF capacitively coupled reactor designed for plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films on spherical surfaces is described. Pictures of the plasma created between the concentrically spherical electrodes, the film surface, and a cross section of the film are presented.
Keywords :
amorphous state; electrodes; plasma CVD; polymer films; scanning electron microscopy; surface morphology; RF capacitively coupled reactor; alpha-C:F films; amorphous fluorocarbon polymer films; electrodes; film surface; plasma-enhanced chemical vapor deposition; surface morphology; Amorphous materials; Chemical vapor deposition; Copper; Dielectric substrates; Electrodes; Inductors; Plasma chemistry; Plasma properties; Polymer films; Radio frequency; Fluorocarbon polymer film; RF capacitively coupled plasma; plasma enhanced chemical vapor deposition;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2008.926844
Filename :
4598931
Link To Document :
