• DocumentCode
    832555
  • Title

    Plasma-Enhanced Chemical Vapor Deposition of Amorphous Fluorocarbon Polymer Films ( a -C:F) on Spherical Surfaces

  • Author

    Biloiu, Costel ; Sakai, Yosuke

  • Author_Institution
    Varian Semicond. Equip. Assoc., Gloucester, MA
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    890
  • Lastpage
    891
  • Abstract
    An RF capacitively coupled reactor designed for plasma-enhanced chemical vapor deposition of amorphous fluorocarbon polymer films on spherical surfaces is described. Pictures of the plasma created between the concentrically spherical electrodes, the film surface, and a cross section of the film are presented.
  • Keywords
    amorphous state; electrodes; plasma CVD; polymer films; scanning electron microscopy; surface morphology; RF capacitively coupled reactor; alpha-C:F films; amorphous fluorocarbon polymer films; electrodes; film surface; plasma-enhanced chemical vapor deposition; surface morphology; Amorphous materials; Chemical vapor deposition; Copper; Dielectric substrates; Electrodes; Inductors; Plasma chemistry; Plasma properties; Polymer films; Radio frequency; Fluorocarbon polymer film; RF capacitively coupled plasma; plasma enhanced chemical vapor deposition;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.926844
  • Filename
    4598931
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=832555