DocumentCode :
833216
Title :
A GaAs/AlGaAs asymmetric Fabry-Perot reflection modulator with very high contrast ratio
Author :
Gerber, D.S. ; Droopad, R. ; Maracas, G.N.
Author_Institution :
Center for Solid State Eng. Res., Arizona State Univ., Tempe, AZ, USA
Volume :
5
Issue :
1
fYear :
1993
Firstpage :
55
Lastpage :
58
Abstract :
Performance results for a normally on, electroabsorptive, surface-normal Fabry-Perot reflection modulator are presented. The device employs a cavity with a 100 AA GaAs/100 AA Al/sub 0.3/Ga/sub 0.7/As multiple quantum well and top and bottom quarter-wave mirrors with 4 and 19.5 periods, respectively. Very low values of off-state reflectance were measured, giving a maximum contrast ratio >1000 (30 dB) and a maximum reflectance difference of 64.3%. The contrast ratio is, to the authors´ knowledge, the largest reported to date.<>
Keywords :
III-V semiconductors; aluminium compounds; electro-optical devices; electroabsorption; gallium arsenide; mirrors; reflectivity; semiconductor quantum wells; 100 AA; GaAs-Al/sub 0.3/Ga/sub 0.7/As; GaAs/AlGaAs asymmetric Fabry-Perot reflection modulator; III-V semiconductor; electroabsorptive surface normal modulator; multiple quantum well; off-state reflectance; quarter-wave mirrors; very high contrast ratio; Absorption; Aluminum; Fabry-Perot; Gallium arsenide; Mirrors; Molecular beam epitaxial growth; Quantum well devices; Reflection; Reflectivity; Superlattices;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.185059
Filename :
185059
Link To Document :
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