Title :
Microplasma Device Utilizing SU-8 Photoresist as a Barrier Rib
Author_Institution :
Dept. of Photonics & Display Inst., Nat. Chiao Tung Univ., Hsinchu
Abstract :
A microplasma device utilizing SU-8 photoresist as a barrier rib has been fabricated and characterized operating in the abnormal mode for neon pressures from 300 to 800 torr and having a hexagonal structure, 5 times 5 arrays of microplasma. The microplasma device, which has a simple fabrication process, offers advantages such as low firing voltage, low cost, and stable glow discharge. The electrical properties have been examined by bipolar voltage waveforms with different frequencies. The geometric patterns of the barrier rib can be simply changed by lithographic techniques.
Keywords :
glow discharges; neon; photoresists; plasma devices; Ne; barrier rib; glow discharge; lithographic techniques; microplasma device; photoresist; pressure 300 torr to 800 torr; Chromium; Costs; Dielectric substrates; Electrodes; Fabrication; Frequency; Glow discharges; Low voltage; Resists; Spatial resolution; Microdischarge;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.922939
