DocumentCode :
833757
Title :
Microfabrication of high-aspect ratio and complex monolithic structures in glass
Author :
Belloy, Eric ; Pawlowski, Anne-Gabrielle ; Sayah, Abdeljalil ; Gijs, Martin A M
Author_Institution :
Inst. of Microelectron. & Microsystems, Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Volume :
11
Issue :
5
fYear :
2002
fDate :
10/1/2002 12:00:00 AM
Firstpage :
521
Lastpage :
527
Abstract :
We present a novel approach for the realization of complex three-dimensional microstructures in brittle materials, like glass. Our technology is based on a beam of eroding powder particles, etching a masked rotating substrate. By using an oblique powder beam and mask under-etching effects, we fabricate monolithic millimeter-high microstructures with an aspect ratio of 5 to 10. This intrinsically very simple microfabrication method also allows to realize in a unique way free-standing monolithic glass microstructures, suspended over many millimeters.
Keywords :
brittleness; glass; micromachining; sputter etching; brittle material; etching process; free-standing monolithic glass microstructure; high aspect ratio structure; mask under-etching effect; microfabrication method; oblique beam; powder particle erosion; rotating substrate; suspended structure; three-dimensional microstructure; Abrasives; Dry etching; Fabrication; Glass; Helium; Microstructure; Particle beams; Powders; Strain measurement; Wet etching;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2002.803418
Filename :
1038847
Link To Document :
بازگشت