Microfabrication of high-aspect ratio and complex monolithic structures in glass

Author

Belloy, Eric ; Pawlowski, Anne-Gabrielle ; Sayah, Abdeljalil ; Gijs, Martin A M

Author_Institution

Inst. of Microelectron. & Microsystems, Swiss Fed. Inst. of Technol., Lausanne, Switzerland

Volume

11

Issue

5

fYear

2002

fDate

10/1/2002 12:00:00 AM

Firstpage

521

Lastpage

527

Abstract

We present a novel approach for the realization of complex three-dimensional microstructures in brittle materials, like glass. Our technology is based on a beam of eroding powder particles, etching a masked rotating substrate. By using an oblique powder beam and mask under-etching effects, we fabricate monolithic millimeter-high microstructures with an aspect ratio of 5 to 10. This intrinsically very simple microfabrication method also allows to realize in a unique way free-standing monolithic glass microstructures, suspended over many millimeters.

Keywords

brittleness; glass; micromachining; sputter etching; brittle material; etching process; free-standing monolithic glass microstructure; high aspect ratio structure; mask under-etching effect; microfabrication method; oblique beam; powder particle erosion; rotating substrate; suspended structure; three-dimensional microstructure; Abrasives; Dry etching; Fabrication; Glass; Helium; Microstructure; Particle beams; Powders; Strain measurement; Wet etching;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/JMEMS.2002.803418

Filename

1038847