Title :
Generation of Micro Inductively Coupled Plasma on a Chip
Author :
Taghioskoui, Mazdak ; Zaghloul, Mona E. ; Montaser, Akbar
Author_Institution :
Dept. of Chem., George Washington Univ., Washington, DC
Abstract :
Inductively coupled plasma (ICP) sources are of great importance for a wide range of applications, including but not limited to micro and nanofabrication, chemical analysis, and plasma processing. Portable and battery-operated instruments can be developed using a miniaturized micro ICP chip considering the low-power and low-voltage requirements of micro ICPs. To the best of authors´ knowledge, this is the first report for generation of a micro ICP on a chip with size of nearly 1 mm using a planar coil with diameter of 800 mum. This chip is capable of producing stable ICPs at the power of 1 W, frequency of 900 MHz, and pressure of 1 torr of helium.
Keywords :
helium; plasma sources; He; battery-operated instruments; chemical analysis; frequency 900 MHz; microfabrication; microinductively coupled plasma sources; nanofabrication; planar coil; plasma generation; plasma processing; plasma-on-a-chip; portable instruments; power 1 W; pressure 1 torr; size 800 mum; Chemical analysis; Coils; Frequency; Helium; Instruments; Nanofabrication; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources; Micro inductively coupled plasma (ICP); plasma-on-a-chip;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.924412
