DocumentCode :
835055
Title :
Substrate Fed I2L Ionizing Radiation Upset Mechanism
Author :
Doyle, Brent R.
Volume :
25
Issue :
6
fYear :
1978
Firstpage :
1525
Lastpage :
1527
Abstract :
The limiting dose rate upset mechanism of substrate fed I2L is caused by NPN secondary collector photocurrents generated as a result of primary photocurrent flows in the intrinsic and extrinsic base. The upset level is related to process parameters, device geometry and chip bias current level. Calculated vs measured upset levels on test vehicle are in good agreement over large bias and upset ranges. To improve the upset level the width of collectors must be minimized to reduce intrinsic base resistance and extrinsic base resistance can be reduced through introducing a P+ extrinsic base diffusion and placing the base contact at the center of the device. As the major photocurrents flow through the devices in the same manner as current supplied by the external injector bias supply, an electrical screen for dose rate hardness is possible.
Keywords :
Contact resistance; Current supplies; Electric resistance; Electrical resistance measurement; Geometry; Ionizing radiation; Photoconductivity; Semiconductor device measurement; Testing; Vehicles;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1978.4329565
Filename :
4329565
Link To Document :
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