DocumentCode :
835582
Title :
Study on recrystallisation of low temperature grown silicon-germanium films for thin firm transistor
Author :
Kao, H.L. ; Yang, S.-Y. ; Hong, J.-W.
Volume :
32
Issue :
5
fYear :
1996
fDate :
2/29/1996 12:00:00 AM
Firstpage :
496
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
Filename :
491174
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=835582
