Title :
Application of weakly ionized plasmas for materials sampling and analysis
Author :
Blades, Michael W. ; Banks, Peter ; Gill, Chris ; Huang, Degui ; Leblanc, C. ; Liang, Dong
Author_Institution :
Dept. of Chem., British Columbia Univ., Vancouver, BC, Canada
fDate :
12/1/1991 12:00:00 AM
Abstract :
The use of weakly ionized plasmas as spectroscopic sources for materials sampling and analysis is reviewed. Plasma sources currently used for this purpose include direct-current and alternating-current plasmas, inductively coupled plasmas, microwave-induced plasmas, surface-wave plasmas, capacitively coupled plasmas, capacitive microwave plasmas, glow discharges, flowing afterglows, theta pinch discharges, exploding films and wires, and laser-produced plasmas. The authors give a summary of relevant characteristics of some of the plasma sources. Included are the source, common method of application, approximate detection limit for that method, applicability for solid sampling, susceptibility to matrix effects, approximate cost, and the most common usage for the method
Keywords :
afterglows; exploding wires and foils; glow discharges; pinch effect; plasma production; plasma production and heating by laser beam; reviews; spectrochemical analysis; alternating-current plasmas; application; capacitive microwave plasmas; capacitively coupled plasmas; detection limit; direct-current plasmas; exploding films and wires; flowing afterglows; glow discharges; inductively coupled plasmas; laser-produced plasmas; materials analysis; materials sampling; matrix effects; microwave-induced plasmas; solid sampling; spectroscopic sources; surface-wave plasmas; theta pinch discharges; weakly ionized plasmas; Optical coupling; Optical materials; Plasma applications; Plasma materials processing; Plasma properties; Plasma sources; Sampling methods; Spectroscopy; Surface discharges; Surface emitting lasers;
Journal_Title :
Plasma Science, IEEE Transactions on