Title :
Capacitive micromachined ultrasonic transducers with diffraction-based integrated optical displacement detection
Author :
Hall, Neal A. ; Lee, Wook ; Degertekin, F. Levent
Author_Institution :
G.W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
Capacitive detection limits the performance of capacitive micromachined ultrasonic transducers (CMUTs) by providing poor sensitivity below megahertz frequencies and limiting acoustic power output by imposing constraints on the membrane-substrate gap height. In this paper, an integrated optical interferometric detection method for CMUTs, which provides high displacement sensitivity independent of operation frequency and device capacitance, is reported. The method also enables optoelectronics integration in a small volume and provides optoelectronic isolation between transmit and receive electronics. Implementation of the method involves fabricating CMUTs on transparent substrates and shaping the electrode under each individual CMUT membrane in the form of an optical diffraction grating. Each CMUT membrane thus forms a phase-sensitive optical diffraction grating structure that is used to measure membrane displacements down to 2/spl times/10/sup -4/ /spl Aring///spl radic/Hz level in the dc to 2-MHz range. Test devices are fabricated on quartz substrates, and ultrasonic array imaging in air is performed using a single 4-mm square CMUT consisting of 19/spl times/19 array of membranes operating at 750 kHz.
Keywords :
diffraction gratings; integrated optoelectronics; light diffraction; micromachining; ultrasonic imaging; ultrasonic transducer arrays; ultrasonic transducers; 2 MHz; 750 kHz; acoustic power output; capacitive detection limits; capacitive micromachined ultrasonic transducers; device capacitance; diffraction-based integrated optical displacement detection; displacement sensitivity; integrated optical interferometric detection method; megahertz frequencies; membrane displacements; membrane-substrate gap height; operation frequency; optical diffraction grating; optoelectronic isolation; optoelectronics integration; phase sensitive optical diffraction grating structure; quartz substrates; transparent substrates; ultrasonic array imaging; Acoustic signal detection; Biomembranes; Diffraction gratings; Frequency; Integrated optics; Optical detectors; Optical diffraction; Optical interferometry; Optical sensors; Ultrasonic transducers;
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
DOI :
10.1109/TUFFC.2003.1251141