• DocumentCode
    838479
  • Title

    Film resistance and constriction effect of current in a contact interface

  • Author

    Nakamura, Mitsunobu ; Minowa, Isao

  • Author_Institution
    Dept. of Electron. Eng., Tamagawa Univ., Tokyo, Japan
  • Volume
    12
  • Issue
    1
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    109
  • Lastpage
    113
  • Abstract
    A computer simulation based on the finite-element method was used to study the conductance of a contact interface, and the property of conductance was investigated using a global model of contact. The contact interface of the model consists of real contact part with the area fraction f and noncontact part (gap) with the area fraction 1-f. This conductance was computed against f. It was made clear that a great deal of current can flow through a small real contact area (current constriction effect) and hence the conductance does not decrease until f becomes close to zero. The increase of film resistance of the real conducting area is taken into account and the behavior of the contact conductance is studied. The decrease of constriction effect is quantitatively shown and discussed with respect to the increase of film resistance.<>
  • Keywords
    electrical contacts; finite element analysis; computer simulation; constriction effect of current; contact interface; current constriction effect; film resistance; finite-element method; global model of contact; real contacting area fraction; Circuits; Computer simulation; Conducting materials; Conductive films; Conductivity; Contact resistance; Finite element methods; Surface cleaning; Surface resistance;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/33.19023
  • Filename
    19023