• DocumentCode
    839114
  • Title

    At-Bias Extraction of Access Parasitic Resistances in AlGaN/GaN HEMTs: Impact on Device Linearity and Channel Electron Velocity

  • Author

    DiSanto, David W. ; Bolognesi, C.R.

  • Author_Institution
    Sch. of Eng. Sci., Simon Fraser Univ., Burnaby, BC
  • Volume
    53
  • Issue
    12
  • fYear
    2006
  • Firstpage
    2914
  • Lastpage
    2919
  • Abstract
    AlGaN/GaN high-electron mobility transistor "hot" parasitic source and drain resistances RS,D are determined under operating biases through wideband S-parameter measurements, without the use of "ColdFET" biasing conditions. Both RS and RD are found to increase dramatically over ColdFET values, both for biases approaching threshold and for open-channel conditions. Parasitic resistance values have a significant effect on the extracted small-signal equivalent circuit model elements, as well as on the apparent device linearity. The bias dependence of access resistances modifies the understanding of the transistor physical operation: A revised delay time analysis accounting for the bias dependence of parasitic resistances shows that the effective average electron velocity in the AlGaN/GaN two-dimensional electron-gas channel is approximately equal to 1.9 times 107 cm/s. This new value of channel velocity is also consistent with the CGS/gMO ratio obtained when the bias dependence of RS and RD is accounted for during the extraction of the transistor small-signal equivalent circuit model
  • Keywords
    aluminium compounds; electric resistance; equivalent circuits; gallium compounds; high electron mobility transistors; semiconductor device models; AlGaN-GaN; ColdFET biasing conditions; HEMT; at-bias extraction; channel electron velocity; device linearity; drain resistances; equivalent circuit model; high electron mobility transistor; hot parasitic source; open channel conditions; parasitic resistances; wideband S-parameter measurements; Aluminum gallium nitride; Electrical resistance measurement; Electrons; Equivalent circuits; Gallium nitride; HEMTs; Linearity; MODFETs; Scattering parameters; Wideband; Delay time analysis; drain resistance; electron velocity; gallium nitride; high-electron mobility transistor (HEMT); source resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2006.885663
  • Filename
    4016335