DocumentCode :
839142
Title :
On the temperature and carrier density dependence of electron saturation velocity in an AlGaN/GaN HEMT
Author :
Oxley, C.H. ; Uren, M.J. ; Coates, A. ; Hayes, D.G.
Author_Institution :
De Montfort Univ., Leicester, UK
Volume :
53
Issue :
3
fYear :
2006
fDate :
3/1/2006 12:00:00 AM
Firstpage :
565
Lastpage :
567
Abstract :
The temperature and carrier density dependence of electron intrinsic saturation velocity (vsi) in a 0.3-μm gate length AlGaN/GaN HEMT was extracted from multibias S-parameter measurements. It was found that vsi fell rapidly with increasing sheet carrier concentration (ns), but was only a very weak function of ambient temperature (Tamb). This behavior is consistent with the hot-phonon model of carrier transport.
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; carrier density; gallium compounds; high electron mobility transistors; wide band gap semiconductors; 0.3 micron; AlGaN-GaN; S-parameter measurements; ambient temperature; carrier density; carrier transport; electron saturation velocity; high-electron mobility transistor; hot-phonon model; quasi-static model; sheet carrier concentration; Aluminum gallium nitride; Charge carrier density; Density measurement; Electrons; Gallium nitride; HEMTs; Length measurement; Scattering parameters; Temperature dependence; Velocity measurement; GaN; heterojunction field-effect transistor (HFET); high-electron mobility transistor (HEMT); quasi-static model; saturation velocity; sheet carrier concentration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2005.863540
Filename :
1597537
Link To Document :
بازگشت