DocumentCode
84035
Title
Enhanced Plasma Uniformity in RF Plasma With Side Multihole
Author
Hyo-Chang Lee ; Chin-Wook Chung
Author_Institution
Dept. of Electr. Eng., Hanyang Univ., Seoul, South Korea
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
2766
Lastpage
2767
Abstract
Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.
Keywords
high-frequency discharges; plasma boundary layers; plasma sources; RF plasma; capacitively coupled plasma source; edge plasma density; hollow cathode effect; plasma uniformity; Cathodes; Discharges (electric); Inductors; Plasma density; Radio frequency; Skin effect; Capacitively coupled plasma (CCP); hollow cathode; plasma uniformity; radio-frequency (RF) gas discharge; radio-frequency (RF) gas discharge.;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2331680
Filename
6850019
Link To Document