Title :
Enhanced Plasma Uniformity in RF Plasma With Side Multihole
Author :
Hyo-Chang Lee ; Chin-Wook Chung
Author_Institution :
Dept. of Electr. Eng., Hanyang Univ., Seoul, South Korea
Abstract :
Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.
Keywords :
high-frequency discharges; plasma boundary layers; plasma sources; RF plasma; capacitively coupled plasma source; edge plasma density; hollow cathode effect; plasma uniformity; Cathodes; Discharges (electric); Inductors; Plasma density; Radio frequency; Skin effect; Capacitively coupled plasma (CCP); hollow cathode; plasma uniformity; radio-frequency (RF) gas discharge; radio-frequency (RF) gas discharge.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2331680
