Title :
Low-pressure conversion studies for YBCO precursors derived by PVD and MOD methods
Author :
List, F.A. ; Clem, P.G. ; Heatherly, L. ; Dawley, J.T. ; Leonard, K.J. ; Lee, D.F. ; Goyal, A.
Author_Institution :
Oak Ridge Nat. Lab., TN, USA
fDate :
6/1/2005 12:00:00 AM
Abstract :
The rate at which thin film YBCO precursor converts to high Jc superconductor depends on many factors including the method by which the precursor is prepared, the precursor film thickness, and the conditions during precursor deposition and conversion. Using in-situ X-ray diffraction and reduced pressures, we have examined and compared conversion rates for precursors prepared by physical vapor deposition (PVD) and metal-organic deposition (MOD). For conversion conditions found to be optimal for obtaining high Jc and high precursor conversion rate (Gp) for PVD precursors, the Gp is nearly identical (∼0.2 nm/sec) for the both PVD and MOD precursors. The development of crystalline BaF2 is, however, distinctly different for the two precursors. This may suggest that conversions of these PVD and MOD precursors follow different chemical pathways. For both precursors, higher Gp is realized using higher water pressure and ramp rate. Although Gp is higher, YBCO is randomly oriented and Jc is zero for the PVD precursor. The MOD precursor seems to be generally more tolerant of higher reaction rates than the PVD precursor. The reaction rate versus PH2O determined for both precursor types shows a square root of PH2O dependence of Gp. This behavior is consistent with a reaction rate limited by gas-phase HF removal.
Keywords :
MOCVD coatings; X-ray diffraction; barium compounds; critical current density (superconductivity); high-temperature superconductors; thickness measurement; vapour deposited coatings; vapour deposition; yttrium compounds; BaF2; MOD method; MOD precursor; PVD method; YBCO precursor; YBa2Cu3O7; crystalline BaF2; gas-phase HF removal; high Jc superconductor; in-situ X-ray diffraction; low-pressure conversion; metal-organic deposition; physical vapor deposition; precursor conversion rate; precursor deposition; precursor film thickness; ramp rate; reaction rate; water pressure; Atherosclerosis; Chemical vapor deposition; Crystallization; Hafnium; Sputtering; Superconducting films; Superconducting thin films; Water; X-ray diffraction; Yttrium barium copper oxide; Precursor conversion; reaction kinetics; superconducting tapes;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2005.847760