• DocumentCode
    840938
  • Title

    A Bayesian Approach for Disturbance Detection and Classification and Its Application to State Estimation in Run-to-Run Control

  • Author

    Wang, Jin ; He, Q. Peter

  • Author_Institution
    Dept. of Chem. Eng., Auburn Univ., AL
  • Volume
    20
  • Issue
    2
  • fYear
    2007
  • fDate
    5/1/2007 12:00:00 AM
  • Firstpage
    126
  • Lastpage
    136
  • Abstract
    With growing demand for effective management of abnormal situations in process industry, disturbance detection and classification has drawn considerable interest from researchers in both industry and academia. In this paper, a disturbance detection and classification method is developed using Bayesian statistics. The theoretical derivation of the proposed method as well as its practical implementation are provided. With the introduction of preand post-change windows, detection and classification are achieved simultaneously in the proposed method through matching the posterior probability pattern to predefined patterns. An overlapping window mechanism is incorporated into the proposed method to minimize detection and classification delay. A simulation example is given to illustrate the robustness and effectiveness of the proposed disturbance detection method. One application of the proposed Bayesian disturbance detection and classification algorithm is a Bayesian enhanced exponentially weighted moving average (B-EWMA) state estimator which improves state estimation in the run-to-run control of semiconductor manufacturing processes. The superior performance of B-EWMA compared to the conventional EWMA is demonstrated using an industrial example
  • Keywords
    Bayes methods; semiconductor device manufacture; state estimation; statistical process control; Bayesian approach; Bayesian disturbance classification algorithm; Bayesian disturbance detection algorithm; Bayesian enhanced exponentially weighted moving average state estimator; Bayesian statistics; disturbance classification method; disturbance detection method; post-change windows; posterior probability pattern; pre-change windows; run-to-run control; semiconductor manufacturing processes; state estimation; Bayesian methods; Classification algorithms; Delay; Manufacturing industries; Manufacturing processes; Pattern matching; Probability; Robustness; State estimation; Statistics; Bayesian statistics; disturbance classification; disturbance detection; process control; state estimation;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2007.895216
  • Filename
    4182439