DocumentCode
840938
Title
A Bayesian Approach for Disturbance Detection and Classification and Its Application to State Estimation in Run-to-Run Control
Author
Wang, Jin ; He, Q. Peter
Author_Institution
Dept. of Chem. Eng., Auburn Univ., AL
Volume
20
Issue
2
fYear
2007
fDate
5/1/2007 12:00:00 AM
Firstpage
126
Lastpage
136
Abstract
With growing demand for effective management of abnormal situations in process industry, disturbance detection and classification has drawn considerable interest from researchers in both industry and academia. In this paper, a disturbance detection and classification method is developed using Bayesian statistics. The theoretical derivation of the proposed method as well as its practical implementation are provided. With the introduction of preand post-change windows, detection and classification are achieved simultaneously in the proposed method through matching the posterior probability pattern to predefined patterns. An overlapping window mechanism is incorporated into the proposed method to minimize detection and classification delay. A simulation example is given to illustrate the robustness and effectiveness of the proposed disturbance detection method. One application of the proposed Bayesian disturbance detection and classification algorithm is a Bayesian enhanced exponentially weighted moving average (B-EWMA) state estimator which improves state estimation in the run-to-run control of semiconductor manufacturing processes. The superior performance of B-EWMA compared to the conventional EWMA is demonstrated using an industrial example
Keywords
Bayes methods; semiconductor device manufacture; state estimation; statistical process control; Bayesian approach; Bayesian disturbance classification algorithm; Bayesian disturbance detection algorithm; Bayesian enhanced exponentially weighted moving average state estimator; Bayesian statistics; disturbance classification method; disturbance detection method; post-change windows; posterior probability pattern; pre-change windows; run-to-run control; semiconductor manufacturing processes; state estimation; Bayesian methods; Classification algorithms; Delay; Manufacturing industries; Manufacturing processes; Pattern matching; Probability; Robustness; State estimation; Statistics; Bayesian statistics; disturbance classification; disturbance detection; process control; state estimation;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2007.895216
Filename
4182439
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