• DocumentCode
    841614
  • Title

    Loss-Reduction in Flexibly Vertical Coupled Ring Lasers Through Asymmetric Double Shallow Ridge and ICP/ICP Cascade Etching

  • Author

    Zhang, R. ; Ren, Z. ; Yu, S.

  • Author_Institution
    Div. of Nano-devices & Nano-Mater., Chinese Acad. of Sci., Suzhou
  • Volume
    20
  • Issue
    22
  • fYear
    2008
  • Firstpage
    1821
  • Lastpage
    1823
  • Abstract
    Loss-reduction in flexibly vertical coupled ring lasers is demonstrated through asymmetric double shallow ridge in the main ring area and inductively coupled plasma (ICP)/ICP cascade etching. Compared with the previous counterpart, the reduced threshold current and enhanced output power are obtained; coupling ratio is tuned from 27% to 1.5% when threshold current is varied from 60 to 80 mA. Single-mode lasing with sidemode-suppression ratio of 27 dB and quality factor of 13120 is achieved when I c=15 mA, I d=58 mA, which are nearly twofolds of that in the previous one. Such strategies can be widely employed to reduce loss in other vertical coupled photonic circuits.
  • Keywords
    laser beams; laser modes; optical fabrication; ridge waveguides; ring lasers; semiconductor lasers; sputter etching; waveguide lasers; ICP/ICP cascade etching; asymmetric double shallow ridge; flexibly vertical coupled ring lasers; inductively coupled plasma; loss reduction; main ring area; Active vertical coupler (AVC); asymmetrical double shallow ridge; inductively coupled plasma (ICP)/ICP etching; rectangular ring laser;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2008.2003396
  • Filename
    4604679