• DocumentCode
    841925
  • Title

    112-GHz collector-up Ge/GaAs heterojunction bipolar transistors with low turn-on voltage

  • Author

    Kawanaka, Masafumi ; Iguchi, Noriyuki ; Sone, Jun´ichi

  • Author_Institution
    Fundamental Res. Labs., NEC Corp., Ibaraki, Japan
  • Volume
    43
  • Issue
    5
  • fYear
    1996
  • fDate
    5/1/1996 12:00:00 AM
  • Firstpage
    670
  • Lastpage
    675
  • Abstract
    This paper reports small-sized collector-up Ge/Ga/As heterojunction bipolar transistors (HBT´s) operating at low power and high frequency. A heavily B-doped Ge base-layer and a newly-developed self-aligned process reduce the base resistance and the parasitic elements. Intrinsic base resistance is 50 Ω/□; this is the lowest value reported for bipolar transistors. With limiting the active emitter area through B ion implantation, these collector-up HBT´s with a collector size of 2×5 μm2 exhibit a current gain of 60. They exhibit a maximum oscillation frequency fmax of 112 GHz with an associated current gain cutoff frequency fT of 25 GHz. The large value of fmax, exceeding 100 GHz, is attributed to the extremely low base resistance caused by the heavily B-doped base-layer and the self-aligned process and to the low base-collector capacitance expected from the collector-up structure. The turn-on voltage of these HBT´s is approximately 0.7 V smaller than that of AlGaAs/GaAs HBT´s. These results show that these HBT´s have excellent potential for low-power dissipation circuits
  • Keywords
    III-V semiconductors; elemental semiconductors; gallium arsenide; germanium; heavily doped semiconductors; heterojunction bipolar transistors; ion implantation; 112 GHz; 2 micron; Ge:B-GaAs; active emitter area; base resistance; base-collector capacitance; collector-up Ge/GaAs heterojunction bipolar transistors; current gain; cutoff frequency; heavily B-doped Ge base-layer; high frequency operation; ion implantation; low-power circuits; maximum oscillation frequency; parasitic elements; self-aligned process; turn-on voltage; Doping; Fabrication; Frequency; Gallium arsenide; Heterojunction bipolar transistors; Low voltage; Molecular beam epitaxial growth; Photonic band gap; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.491241
  • Filename
    491241