• DocumentCode
    842010
  • Title

    Modelling and characterization of the reverse recovery of a high-power GaAs Schottky diode

  • Author

    Pendharkar, Sameer P. ; Winterhalter, Craig R. ; Shenai, Krishna

  • Author_Institution
    Dept. of Electron. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • Volume
    43
  • Issue
    5
  • fYear
    1996
  • fDate
    5/1/1996 12:00:00 AM
  • Firstpage
    685
  • Lastpage
    690
  • Abstract
    The reverse recovery characteristics of high-power GaAs Schottky rectifiers are reported at various temperatures; mixed device and circuit simulations were used to study the internal plasma dynamics during the reverse recovery process. In this approach, semiconductor transport and heat generation and diffusion equations were solved self-consistently using a two-dimensional (2-D) finite element grid structure under boundary conditions imposed by the measurement circuit. The simulation results are shown to be in good agreement with the measured data at temperatures in the range of 25°C to 125°C. These results are compared with the reverse recovery characteristics of a commercial silicon PIN power rectifier under identical conditions and it is shown that carrier depletion is the dominant mechanism causing the reverse recovery in a GaAs Schottky diode. The reverse recovery power loss is negligible in a GaAs Schottky rectifier and is shown to decrease as the case temperature is increased, contrary to the silicon PIN rectifier behaviour
  • Keywords
    III-V semiconductors; Schottky diodes; finite element analysis; gallium arsenide; losses; power semiconductor diodes; semiconductor device models; solid-state rectifiers; thermal analysis; 25 to 125 C; 2D finite element grid structure; GaAs; Schottky rectifiers; boundary conditions; carrier depletion; characterization; diffusion equations; heat generation equations; high-power Schottky diode; internal plasma dynamics; modelling; reverse recovery characteristics; reverse recovery power loss; semiconductor transport equations; two-dimensional grid structure; Circuit simulation; Gallium arsenide; Plasma devices; Plasma measurements; Plasma properties; Plasma simulation; Plasma temperature; Rectifiers; Silicon; Temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.491243
  • Filename
    491243