DocumentCode
842010
Title
Modelling and characterization of the reverse recovery of a high-power GaAs Schottky diode
Author
Pendharkar, Sameer P. ; Winterhalter, Craig R. ; Shenai, Krishna
Author_Institution
Dept. of Electron. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
Volume
43
Issue
5
fYear
1996
fDate
5/1/1996 12:00:00 AM
Firstpage
685
Lastpage
690
Abstract
The reverse recovery characteristics of high-power GaAs Schottky rectifiers are reported at various temperatures; mixed device and circuit simulations were used to study the internal plasma dynamics during the reverse recovery process. In this approach, semiconductor transport and heat generation and diffusion equations were solved self-consistently using a two-dimensional (2-D) finite element grid structure under boundary conditions imposed by the measurement circuit. The simulation results are shown to be in good agreement with the measured data at temperatures in the range of 25°C to 125°C. These results are compared with the reverse recovery characteristics of a commercial silicon PIN power rectifier under identical conditions and it is shown that carrier depletion is the dominant mechanism causing the reverse recovery in a GaAs Schottky diode. The reverse recovery power loss is negligible in a GaAs Schottky rectifier and is shown to decrease as the case temperature is increased, contrary to the silicon PIN rectifier behaviour
Keywords
III-V semiconductors; Schottky diodes; finite element analysis; gallium arsenide; losses; power semiconductor diodes; semiconductor device models; solid-state rectifiers; thermal analysis; 25 to 125 C; 2D finite element grid structure; GaAs; Schottky rectifiers; boundary conditions; carrier depletion; characterization; diffusion equations; heat generation equations; high-power Schottky diode; internal plasma dynamics; modelling; reverse recovery characteristics; reverse recovery power loss; semiconductor transport equations; two-dimensional grid structure; Circuit simulation; Gallium arsenide; Plasma devices; Plasma measurements; Plasma properties; Plasma simulation; Plasma temperature; Rectifiers; Silicon; Temperature measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.491243
Filename
491243
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