DocumentCode
842419
Title
A potential integrated low temperature approach for superconducting MgB2 thin film growth and electronics device fabrication by ion implantation
Author
Peng, Nianhua ; Jeynes, Christopher ; Gwilliam, Russell M. ; Kirkby, Karen J. ; Webb, Roger P. ; Shao, Guosheng ; Astill, Douglas M. ; Liang, W.Y.
Author_Institution
Ion Beam Centre, Univ. of Surrey, Guildford, UK
Volume
15
Issue
2
fYear
2005
fDate
6/1/2005 12:00:00 AM
Firstpage
3265
Lastpage
3268
Abstract
By implanting high fluence B into Mg targets, we demonstrate clearly that superconducting MgB2 thin films can be formed at a low process temperature. The superconducting transition temperature Tc values observed are dependent on the growth condition. The ion beam synthesis experimental data are discussed and compared with simulation results of the B implantation process in Mg target. We propose that ion beam synthesis of MgB2 is a potential approach for the mass production of superconducting electronics devices.
Keywords
ion beam assisted deposition; ion implantation; magnesium compounds; superconducting integrated circuits; superconducting thin films; superconducting transition temperature; type II superconductors; MgB2; electronics device fabrication; ion beam synthesis; ion implantation; potential integrated low temperature approach; superconducting thin film growth; superconducting transition temperature; Fabrication; High temperature superconductors; Ion beams; Ion implantation; Sputtering; Superconducting devices; Superconducting epitaxial layers; Superconducting thin films; Superconducting transition temperature; Thin film devices; Ion beam synthesis; thin films;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/TASC.2005.848848
Filename
1440368
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