• DocumentCode
    842585
  • Title

    An amorphous silicon TFT with annular-shaped channel and reduced gate-source capacitance

  • Author

    Byun, Young Hee ; Den Boer, Willem ; Yang, Mohshi ; Gu, Tieer

  • Author_Institution
    Opt. Imaging Syst. Inc., Northville, MI, USA
  • Volume
    43
  • Issue
    5
  • fYear
    1996
  • fDate
    5/1/1996 12:00:00 AM
  • Firstpage
    839
  • Lastpage
    841
  • Abstract
    An amorphous silicon thin-film transistor (a-Si TFT) with an annular-shaped channel is presented. The annular-channel TFT (AC-TFT) is fabricated using standard design rules with 4 μm minimum feature size which is common in large area applications such as active matrix LCD´s. The AC-TFT has two times smaller gate-to-source capacitance of about 50 fF in the on-state as compared to a conventional rectangular-channel TFT (RC-TFT) which has the same on-current of more than 10 μA at Vgs =20 V and Vds=10 V. Its off-current under illumination from the gate side is about ten times lower than that of the RC-TFT
  • Keywords
    amorphous semiconductors; capacitance; elemental semiconductors; field effect transistor switches; liquid crystal displays; silicon; thin film transistors; 10 V; 20 V; 4 micron; 50 fF; Si; TFT; active matrix LCD; annular-shaped channel; minimum feature size; off-current; on-current; reduced gate-source capacitance; standard design rules; Amorphous silicon; Capacitance; Conductivity; Diodes; Doping; Electrical resistance measurement; Electron devices; Geometry; Temperature distribution; Thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.491263
  • Filename
    491263