DocumentCode :
842591
Title :
Submicron scaling of AlGaAs/GaAs self-aligned thin emitter heterojunction bipolar transistors (SATE-HBT) with current gain independent of emitter area
Author :
Malik, R.J. ; Lunardi, L.M. ; Ryan, R.W. ; Shunk, S.C. ; Feuer, Mark D.
Author_Institution :
AT&T Bell Labs., Murray Hill, NJ, USA
Volume :
25
Issue :
17
fYear :
1989
Firstpage :
1175
Lastpage :
1177
Abstract :
A new, self-aligned process technology for AlGaAs/GaAs heterojunction bipolar transistors (HBT) has been developed, which is based upon ultrathin (100-200 AA) AlGaAs emitter layers. The thin AlGaAs emitter is used as a selective etch stop layer for contacting the p+ base layer and acts as an integral surface passivation layer which eliminates recombination currents in the extrinsic base region. This novel technology yields transistors with emitter dimensions as small as 0.3*4.0 mu m2 and current gain values independent of emitter area.
Keywords :
III-V semiconductors; aluminium compounds; etching; gallium arsenide; heterojunction bipolar transistors; passivation; 100 to 200 AA; AlGaAs-GaAs; SATE HBT; current gain; current gain values; emitter area; emitter dimensions; extrinsic base region; integral surface passivation layer; selective etch stop layer; self-aligned process technology; self-aligned thin emitter heterojunction bipolar transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19890788
Filename :
41939
Link To Document :
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