DocumentCode
843465
Title
Application of Ion-Induced X-Ray Emission for the Measurement of Stopping Powers
Author
Kliwer, James ; ElFiqi, Ashraf
Author_Institution
Department of Physics, University of Nevada, Reno, Nevada, 89557
Volume
26
Issue
1
fYear
1979
Firstpage
1323
Lastpage
1325
Abstract
The method for measuring the stopping power of materials for charged particles using ion-induced x-ray emission is described in detail, and the results for 100-keV protons on yttrium and samarium are presented to exemplify the method. By utilizing a lithium-drifted silicon detector, the thickness and uniformity of the stopping film can be monitored simultaneously with the collection of stopping power data. In addition, it will be shown that the incorporation of a backscattering spectrometer with the ion-induced x-ray system can yield two independent measurements of the energy loss in the stopping film, and at the same time detect impurities that might be present in the film.
Keywords
Current measurement; Detectors; Monitoring; Particle measurements; Power measurement; Protons; Samarium; Semiconductor films; Silicon; Yttrium;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1979.4330379
Filename
4330379
Link To Document