DocumentCode :
843465
Title :
Application of Ion-Induced X-Ray Emission for the Measurement of Stopping Powers
Author :
Kliwer, James ; ElFiqi, Ashraf
Author_Institution :
Department of Physics, University of Nevada, Reno, Nevada, 89557
Volume :
26
Issue :
1
fYear :
1979
Firstpage :
1323
Lastpage :
1325
Abstract :
The method for measuring the stopping power of materials for charged particles using ion-induced x-ray emission is described in detail, and the results for 100-keV protons on yttrium and samarium are presented to exemplify the method. By utilizing a lithium-drifted silicon detector, the thickness and uniformity of the stopping film can be monitored simultaneously with the collection of stopping power data. In addition, it will be shown that the incorporation of a backscattering spectrometer with the ion-induced x-ray system can yield two independent measurements of the energy loss in the stopping film, and at the same time detect impurities that might be present in the film.
Keywords :
Current measurement; Detectors; Monitoring; Particle measurements; Power measurement; Protons; Samarium; Semiconductor films; Silicon; Yttrium;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1979.4330379
Filename :
4330379
Link To Document :
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