• DocumentCode
    843465
  • Title

    Application of Ion-Induced X-Ray Emission for the Measurement of Stopping Powers

  • Author

    Kliwer, James ; ElFiqi, Ashraf

  • Author_Institution
    Department of Physics, University of Nevada, Reno, Nevada, 89557
  • Volume
    26
  • Issue
    1
  • fYear
    1979
  • Firstpage
    1323
  • Lastpage
    1325
  • Abstract
    The method for measuring the stopping power of materials for charged particles using ion-induced x-ray emission is described in detail, and the results for 100-keV protons on yttrium and samarium are presented to exemplify the method. By utilizing a lithium-drifted silicon detector, the thickness and uniformity of the stopping film can be monitored simultaneously with the collection of stopping power data. In addition, it will be shown that the incorporation of a backscattering spectrometer with the ion-induced x-ray system can yield two independent measurements of the energy loss in the stopping film, and at the same time detect impurities that might be present in the film.
  • Keywords
    Current measurement; Detectors; Monitoring; Particle measurements; Power measurement; Protons; Samarium; Semiconductor films; Silicon; Yttrium;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1979.4330379
  • Filename
    4330379