Title :
A 20 dBm Linear RF Power Amplifier Using Stacked Silicon-on-Sapphire MOSFETs
Author :
Jeong, Jinho ; Pornpromlikit, Sataporn ; Asbeck, Peter M. ; Kelly, Dylan
Author_Institution :
Univ. of California
Abstract :
In this letter, a fully integrated 20-dBm RF power amplifier (PA) is presented using 0.25-mum-gate silicon-on-sapphire metal-oxide-semiconductor field-effect transistors (MOSFETs). To overcome the low breakdown voltage limit of MOSFETs, a stacked FET structure is employed, where transistors are connected in series so that each output voltage swing is added in phase. By using triple-stacked FETs, the optimum load impedance for a 20-dBm PA increases to 50Omega, which is nine times higher than that of parallel FET topology for the same output power. Measurement of a single-stage linear PA shows small-signal gain of 17.1 dB and saturated output power of 21.0dBm with power added efficiency (PAE) of 44.0% at 1.88 GHz. With an IS-95 code division multiple access modulated signal, the PA shows an average output power of 16.3 dBm and PAE of 18.7% with adjacent channel power ratio below -42dBc
Keywords :
MOSFET; code division multiple access; power amplifiers; sapphire; silicon compounds; 0.25 micron; 1.88 GHz; 17.1 dB; FET topology; MOSFET; Si-Al2O3; adjacent channel power ratio; breakdown voltage; code division multiple access; linear RF power amplifier; metal oxide semiconductor field effect transistor; output voltage swing; power added efficiency; stacked silicon-on-sapphire; stacked transistors; Breakdown voltage; FETs; Impedance; MOSFETs; Power amplifiers; Power generation; Power measurement; Radio frequency; Radiofrequency amplifiers; Topology; Metal-oxide-semiconductor field-effect transistor (MOSFET); power amplifier (PA); silicon-on-sapphire (SOS); stacked transistors;
Journal_Title :
Microwave and Wireless Components Letters, IEEE
DOI :
10.1109/LMWC.2006.885634