DocumentCode :
844341
Title :
Pulsed Electron Beams for Annealing of Ion-Implanted Silicon
Author :
Little, R.G. ; Greenwald, A.C. ; Minnucci, J.A.
Author_Institution :
Spire Corporation Bedford, Massachusetts 01730
Volume :
26
Issue :
1
fYear :
1979
Firstpage :
1683
Lastpage :
1685
Keywords :
Annealing; Conducting materials; Electron beams; Photovoltaic cells; Power transmission lines; Pulsed power supplies; Semiconductor diodes; Semiconductor materials; Silicon; Temperature;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1979.4330462
Filename :
4330462
Link To Document :
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