Title :
Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films
Author :
Sobue, Masataka ; Segawa, Takayuki ; Yokoshima, Tokihiko ; Osaka, Tetsuya ; Kaneko, Daiju ; Tanaka, Atsushi
Author_Institution :
Dept. of Appl. Chem., Waseda Univ., Tokyo, Japan
fDate :
9/1/2002 12:00:00 AM
Abstract :
In order to increase the resistivity of electroless-deposited high-Bs CoNiFeB thin films, it was decided to investigate the effect of adding a β-alanine containing complexing agent to the plating bath. The resistivity (ρ) gradually increased as the β-alanine concentration was increased. CoNiFeB thin films with desirable soft magnetic properties, Bs = 17-17.5 kG and Hc < 3.0 Oe, were obtained under these conditions with ρ value (70-90 μΩ cm) dependent on carbon incorporation in the films. It has been suggested that carbon impurities in the films resulting from the use of the β-alanine complexing agent containing -NH2 group causes electron scattering, leading to an increase in the resistivity.
Keywords :
boron alloys; cobalt alloys; electrical resistivity; electroless deposited coatings; ferromagnetic materials; iron alloys; magnetic core stores; magnetic heads; magnetic permeability; magnetic thin films; metallic thin films; nickel alloys; soft magnetic materials; β-alanine containing complexing agent; -NH2 group; 17 to 17.5 kG; 70 to 90 muohm; Co65Ni13Fe21B1; CoNiFeB:C; carbon impurities; carbon incorporation; electroless-deposited high-Bs CoNiFeB thin films; electron scattering; magnetic recording density; merged GMR-head; plating bath; resistivity increase; soft magnetic properties; write-head core materials; Conductivity; Magnetic cores; Magnetic field measurement; Magnetic films; Magnetic heads; Magnetic materials; Magnetic properties; Magnetic recording; Soft magnetic materials; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.802676
