DocumentCode
845622
Title
A Universal Negative or Positive Ion Source
Author
Alton, G.D.
Author_Institution
Oak Ridge National Laboratory Oak Ridge, Tennessee 37830
Volume
26
Issue
3
fYear
1979
fDate
6/1/1979 12:00:00 AM
Firstpage
3708
Lastpage
3712
Abstract
This report describes a multipurpose negative or positive ion source which can be used in a variety of low energy or high energy research applications. Conversion from negative/positive modes of operation can be accomplished by simply reversing the polarities of pertinent extraction and beam transport power supplies. Preliminary results obtained from recent evaluative studies along with design details and negative and positive yields observed to data are given. Thus far, the source has demonstrated ¿A intensity capabilities for several negative and positive ion species including C-, Cu-, Au-, N+, N2+, P+, A+, and Cs+.
Keywords
Apertures; Electrons; Ion beams; Ion sources; Ionization; Plasma materials processing; Plasma sheaths; Plasma sources; Plasma temperature; Sputtering;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1979.4330587
Filename
4330587
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