• DocumentCode
    845622
  • Title

    A Universal Negative or Positive Ion Source

  • Author

    Alton, G.D.

  • Author_Institution
    Oak Ridge National Laboratory Oak Ridge, Tennessee 37830
  • Volume
    26
  • Issue
    3
  • fYear
    1979
  • fDate
    6/1/1979 12:00:00 AM
  • Firstpage
    3708
  • Lastpage
    3712
  • Abstract
    This report describes a multipurpose negative or positive ion source which can be used in a variety of low energy or high energy research applications. Conversion from negative/positive modes of operation can be accomplished by simply reversing the polarities of pertinent extraction and beam transport power supplies. Preliminary results obtained from recent evaluative studies along with design details and negative and positive yields observed to data are given. Thus far, the source has demonstrated ¿A intensity capabilities for several negative and positive ion species including C-, Cu-, Au-, N+, N2+, P+, A+, and Cs+.
  • Keywords
    Apertures; Electrons; Ion beams; Ion sources; Ionization; Plasma materials processing; Plasma sheaths; Plasma sources; Plasma temperature; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1979.4330587
  • Filename
    4330587