DocumentCode :
845961
Title :
Nonequivalent heterointerfaces in AlGaAs/GaAs double barrier resonant tunnelling diodes grown by metalorganic vapour phase epitaxy
Author :
Tews, H. ; Schnell, R.D. ; Neumann, Robert
Author_Institution :
Siemens Res. Labs., Munich, West Germany
Volume :
25
Issue :
25
fYear :
1989
Firstpage :
1709
Lastpage :
1711
Abstract :
The peak/valley current ratio, of AlGaAs/GaAs double barrier resonant tunnelling diodes at room temperature is found to be very sensitive to the quality of the GaAs/AlGaAs interface, while the AlGaAs/GaAs interface is much less critical.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; p-n heterojunctions; tunnel diodes; vapour phase epitaxial growth; AlGaAs-GaAs; III-V semiconductors; MOVPE; double barrier; metalorganic vapour phase epitaxy; nonequivalent heterointerfaces; peak/valley current ratio; resonant tunnelling diodes; room temperature;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19891143
Filename :
41982
Link To Document :
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