DocumentCode :
846654
Title :
A novel geometric resizing technique for data conversion from CAD data to electron beam exposure data
Author :
Okubo, Tsuneo ; Watanabe, Takashi ; Wada, Kou ; Saito, Kazuyuki
Author_Institution :
NTT LSI Lab., Kanagawa, Japan
Volume :
11
Issue :
9
fYear :
1992
fDate :
9/1/1992 12:00:00 AM
Firstpage :
1104
Lastpage :
1113
Abstract :
A novel resizing algorithm, based on the effective use of the hierarchical structure of CAD data, is proposed to speed up the conversion time for CAD data conversion into electron beam exposure data. Resizing can be performed even for overlap between cells, which has been usually allowed in CAD data and has interrupted the hierarchical treatment in the data conversion, by introducing three key techniques: cut and abandon, link mark, and null edge. The total conversion time of a 13 K-gate LSI circuit is improved by a factor of 3.8, with the shape handling time by a factor of 5.1, compared with a conventional method. Experimental results show that overhead can be ignored by introducing the new techniques in hierarchical treatment
Keywords :
circuit layout CAD; electron beam lithography; large scale integration; network routing; CAD data; LSI circuit; conversion time; cut and abandon; data conversion; electron beam exposure data; geometric resizing technique; link mark; null edge; overlap; shape handling time; Central Processing Unit; Circuits; Data conversion; Design automation; Electron beams; Large scale integration; Proximity effect; Shape control; Very large scale integration; Writing;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/43.159996
Filename :
159996
Link To Document :
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