A novel geometric resizing technique for data conversion from CAD data to electron beam exposure data

Author

Okubo, Tsuneo ; Watanabe, Takashi ; Wada, Kou ; Saito, Kazuyuki

Author_Institution

NTT LSI Lab., Kanagawa, Japan

Volume

11

Issue

9

fYear

1992

fDate

9/1/1992 12:00:00 AM

Firstpage

1104

Lastpage

1113

Abstract

A novel resizing algorithm, based on the effective use of the hierarchical structure of CAD data, is proposed to speed up the conversion time for CAD data conversion into electron beam exposure data. Resizing can be performed even for overlap between cells, which has been usually allowed in CAD data and has interrupted the hierarchical treatment in the data conversion, by introducing three key techniques: cut and abandon, link mark, and null edge. The total conversion time of a 13 K-gate LSI circuit is improved by a factor of 3.8, with the shape handling time by a factor of 5.1, compared with a conventional method. Experimental results show that overhead can be ignored by introducing the new techniques in hierarchical treatment

Keywords

circuit layout CAD; electron beam lithography; large scale integration; network routing; CAD data; LSI circuit; conversion time; cut and abandon; data conversion; electron beam exposure data; geometric resizing technique; link mark; null edge; overlap; shape handling time; Central Processing Unit; Circuits; Data conversion; Design automation; Electron beams; Large scale integration; Proximity effect; Shape control; Very large scale integration; Writing;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/43.159996

Filename

159996