• DocumentCode
    847798
  • Title

    Characteristics of a vacuum spark triggered by the transient hollow cathode discharge electron beam

  • Author

    Wong, Chiow San ; Ong, Chia Xian ; Moo, Siew Pheng ; Choi, Peter

  • Author_Institution
    Plasma Res. Lab., Malaya Univ., Kuala Lumpur, Malaysia
  • Volume
    23
  • Issue
    3
  • fYear
    1995
  • fDate
    6/1/1995 12:00:00 AM
  • Firstpage
    265
  • Lastpage
    269
  • Abstract
    The discharge characteristics of a vacuum spark triggered by the transient hollow cathode discharge (THCD) electron beam is investigated over a wide variety of discharge conditions. Two systems of the vacuum spark device have been considered-the first system powered by eight 2700-pF doorknob capacitors charged to a voltage of 40 kV (input energy of 17.6 J); while the second system employs a single 1.85-μF Maxwell capacitor discharged at a voltage of 20 kV (input energy of 370 J). The operating pressure of these systems has been varied over the range of 10 -2 to 10-5 mbar in order to examine the effect of the operating pressure on the plasma formation of the vacuum spark discharge. The effectiveness of plasma heating has been found to be significantly enhanced in the two vacuum spark systems studied here. In particular, the plasma of the 17.6 J system has been observed to be heated to a condition hot enough to emit in the X-ray region when the operating pressure is reduced from 10-2 to 10-5 mbar. Similarly, in the case of the 370 J system, hot spot formation is also observed to occur only at a low operating pressure of 10-4 mbar
  • Keywords
    electron beams; glow discharges; plasma diagnostics; plasma heating; sparks; 0.01 to 0.00001 mbar; 1.85 muF; 17.6 J; 20 kV; 2700 pF; 370 J; 40 kV; Maxwell capacitor; X-ray region; discharge characteristics; doorknob capacitors; plasma formation; transient hollow cathode discharge electron beam; vacuum spark; vacuum spark device; Anodes; Capacitors; Cathodes; Electrodes; Electron beams; Elementary particle vacuum; Plasmas; Sparks; Vacuum systems; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.402312
  • Filename
    402312