Title :
Understanding the magnetic anisotropy in Fe-Si amorphous alloys
Author :
Díaz, J. ; Hamdan, N. ; Jalil, P. ; Hussain, Zahid ; Valvidares, S.M. ; Alameda, J.M.
Author_Institution :
Dept. de Fisica, Oviedo Univ., Spain
fDate :
9/1/2002 12:00:00 AM
Abstract :
The origin of the magnetic anisotropy in a very disordered Fe-Si alloy has been investigated. The alloy containing 40% at. Si was prepared in the form of a thin film in a dc magnetron sputtering chamber. Structural disorder was obtained from extended X-ray absorption fine structure spectroscopy. The uniformity and lack of inhomogeneities at a microscopic level was checked by measuring their transverse magnetic susceptibility and hysteresis loops. The orbital component of the magnetic moment was measured by X-ray magnetic circular dichroism spectroscopy. The orbital moment was extraordinary high, 0.4 μB. Such a high value contrasted with the relatively small uniaxial anisotropy energy of the thin film (2 kJ/m3). This suggests that the cause of the magnetic anisotropy in this alloy was a small degree of correlation in the orientation of the local orbital moments along a preferential direction.
Keywords :
EXAFS; amorphous magnetic materials; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic circular dichroism; magnetic hysteresis; magnetic moments; magnetic susceptibility; magnetic thin films; silicon alloys; sputtered coatings; Fe-Si; Fe-Si amorphous alloys; X-ray magnetic circular dichroism spectroscopy; dc magnetron sputtering chamber; extended X-ray absorption fine structure spectroscopy; hysteresis loops; local orbital moments; magnetic anisotropy; magnetic moment orbital component; structural disorder; thin film; transverse magnetic susceptibility; uniaxial anisotropy energy; Amorphous magnetic materials; Amorphous materials; Electromagnetic wave absorption; Extraterrestrial measurements; Magnetic anisotropy; Magnetic force microscopy; Perpendicular magnetic anisotropy; Semiconductor thin films; Spectroscopy; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.803566