Title :
Statics and dynamics in giant magnetostrictive TbxFe1-x-Fe0.6Co0.4 multilayers for MEMS
Author :
Youssef, J.B. ; Tiercelin, N. ; Petit, F. ; Le Gall, H. ; Preobrazhensky, V. ; Pernod, P.
Author_Institution :
Lab. de Magnetisme de Bretagne, Brest, France
fDate :
9/1/2002 12:00:00 AM
Abstract :
In the present paper, giant magnetostrictive (GMS) thin films have been investigated for future microelectromechanical systems (MEMS) purposes. To this end, flexural and torsional motions have been studied in low-field anisotropic GMS single-domain state (SDS) exchange-coupled TbFe-FeCo multilayers (ECML). The magnetoelastic (ME) coefficient bγ,2 depends strongly on the ECML structures, compositions, and sputtering deposition parameters. GMS multilayers with a high bγ,2 (18 MPa for TbFe2/Fe0.6Co0.4 compared to 11 MPa for TbFe2/Fe) were obtained with or without an in-plane easy axis with a controlled direction, and without any annealing postprocess. Dynamical excitations of the actuators have been investigated under various conditions. An enhancement up to a factor 5 of the oscillations compared to the TbFe-Fe multilayers is observed with the possibility to tune the flexural/torsional dynamical behavior of these cantilevers. The corresponding very large dynamical ME susceptibility of these improved uniaxial ECML gives the possibility to control GMS MEMS with further reduction of the excitation field down to a few oersteds.
Keywords :
cobalt alloys; electromagnetic actuators; exchange interactions (electron); iron alloys; magnetic hysteresis; magnetic multilayers; magnetoelastic effects; magnetostriction; magnetostrictive devices; microactuators; sputter deposition; terbium alloys; M-H loops; MEMS; TbFe2-Fe0.6Co0.4; actuator dynamical excitations; dynamical magnetoelastic susceptibility; flexural motions; flexural/torsional dynamical behavior tuning; giant magnetostrictive TbxFe1-x-Fe0.6Co0.4 multilayers; in-plane easy axis; low-field anisotropic GMS single-domain state exchange-coupled multilayers; magnetoelastic coefficient; microelectromechanical systems; spin reorientation transition; sputtering deposition parameters; torsional motions; Anisotropic magnetoresistance; Annealing; Iron; Magnetic anisotropy; Magnetic multilayers; Magnetostriction; Microelectromechanical systems; Micromechanical devices; Perpendicular magnetic anisotropy; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.803568