Title :
Optimization of the ΔE effect in thin films and multilayers by magnetic field annealing
Author :
Ludwig, Alfred ; Quandt, Eckhard
Author_Institution :
Center of Adv. Eur. Studies & Res., Bonn, Germany
fDate :
9/1/2002 12:00:00 AM
Abstract :
The ΔE effect of amorphous (Fe90Co10)78Si12B10 and Tb40Fe60 thin films as well as of Tb40Fe60/Fe50Co50 multilayers deposited on Si substrates using magnetron sputtering has been investigated. Influences of sputtering parameters and especially annealing conditions on the ΔE effect are discussed. In a field-annealed amorphous (Fe90Co10)78Si12B10 thin film, the ΔE effect is about 30%, assuming the Young´s modulus of the film as 150 GPa. It was found that in case of thin-film substrate compounds, the magnetostrictive susceptibility is the determining factor of the size and field dependence of the ΔE effect.
Keywords :
Young´s modulus; amorphous magnetic materials; boron alloys; cobalt alloys; ferromagnetic materials; iron alloys; magnetic annealing; magnetic hysteresis; magnetic multilayers; magnetic thin films; magnetoelastic effects; magnetostriction; metallic glasses; silicon alloys; sputtered coatings; terbium alloys; (Fe90Co10)78Si12B10; Si; Si substrates; Tb40Fe60; Tb40Fe60-Fe50Co50; Tb40Fe60/Fe50Co50 multilayers; Young modulus; amorphous (Fe90Co10)78Si12B10 thin films; amorphous Tb40Fe60 thin films; anisotropy contributions; annealing conditions; field dependence; field-annealed amorphous (Fe90Co10)78Si12B10 thin film; magnetic field annealing; magnetic hysteresis loops; magnetoelastic material; magnetostrictive susceptibility; magnetron sputtering; multilayers; size dependence; sputtering parameters; thin films; thin-film substrate compounds; Amorphous magnetic materials; Amorphous materials; Annealing; Iron; Magnetic films; Magnetic multilayers; Magnetostriction; Semiconductor thin films; Sputtering; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.802467
