DocumentCode
848931
Title
A new contact conductance measurement technique for metal-HTSC film contact
Author
Apte, P.R. ; Kumar, D. ; Pinto, R. ; Sharon, M. ; Gupta, L.C. ; Vijayaraghavan, R.
Author_Institution
Tata Inst. of Fundamental Res., Bombay, India
Volume
2
Issue
3
fYear
1992
Firstpage
176
Lastpage
180
Abstract
A four-point contact conductance measurement technique has been developed for measuring the contact conductance of the metal-HTSC film interface. A distributed RG model predicts a small nonzero (residual) resistance from which the contact conductance is determined. The measurement technique is described along with first results.<>
Keywords
contact resistance; electric admittance measurement; electrical contacts; high-temperature superconductors; superconducting junction devices; superconducting thin films; Ag; Pd; Ti; contact conductance measurement technique; distributed RG model; four-point contact; metal-high T/sub c/ superconductor film contact; residual resistance; Conductive films; Contact resistance; Electrical resistance measurement; Measurement techniques; Roentgenium; Semiconductor films; Silver; Substrates; Superconducting films; Temperature;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.160157
Filename
160157
Link To Document