Title :
Controlling the induced anisotropy in soft magnetic films for high-frequency applications
Author :
Chezan, A.R. ; Craus, C.B. ; Chechenin, N.G. ; Vystavel, T. ; de Hosson, J.Th.M. ; Niesen, L. ; Boerma, D.O.
Author_Institution :
Mater. Sci. Center, Groningen Univ., Netherlands
fDate :
9/1/2002 12:00:00 AM
Abstract :
Nanocrystalline soft magnetic Fe-Zr-N films were successfully deposited by dc magnetron reactive sputtering. The nitrogen content was controlled by varying the Ar/N2 ratio and/or the substrate temperature. The films have saturation magnetization and induced uniaxial anisotropy values in the range 17-21 kG and 0-30 Oe, respectively. The origin of the induced anisotropy is discussed. The films can be used as magnetic cores for inductors at gigahertz frequencies.
Keywords :
Rutherford backscattering; X-ray diffraction; ferromagnetic materials; grain refinement; grain size; induced anisotropy (magnetic); interstitials; iron alloys; magnetic cores; magnetic hysteresis; magnetic thin films; nanostructured materials; soft magnetic materials; sputter deposition; sputtered coatings; texture; transmission electron microscopy; zirconium alloys; Fe-Zr-N; Rutherford backscattering; X-ray diffraction; average grain size; columnar structure; controlled nitrogen content; deposition conditions; deposition temperature; elastic recoil detection; grain refinement; growth rate; high-frequency applications; hysteresis loops; induced anisotropy control; interstitial octahedral sites; magnetic cores; magnetron reactive sputtered films; nanocrystalline soft magnetic films; saturation magnetization; texture; transmission electron microscopy; uniaxial anisotropy; Anisotropic magnetoresistance; Argon; Magnetic anisotropy; Magnetic films; Nitrogen; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Sputtering; Temperature control;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.802423
