Title :
Very high electrical resistivity and heteroamorphous structure of soft magnetic (Co35.6Fe50B14.4)-(SiO2) thin films
Author :
Munakata, M. ; Motoyama, M. ; Yagi, M. ; Ito, T. ; Shimada, Y. ; Yamaguchi, M. ; Arai, Ken-Ichi
Author_Institution :
Energy Electron. Lab., Sojo Univ., Kumamoto, Japan
fDate :
9/1/2002 12:00:00 AM
Abstract :
(Co35.6Fe50B14.4)-(SiO2) soft magnetic films with electrical resistivity of over 10000 μΩ · cm (1 × 10-4 Ωm) were fabricated on glass substrates by using synchronous triple-RF magnetron sputtering. The magnetic properties, high-frequency permeability characteristics, and microstructure of the films were investigated. Maximum electrical resistivity of about 115600 μΩ · cm (1.156 × 10-3 Ωm) was obtained with a large uniaxial anisotropy field Hk of about 250 Oe, a hard axis coercivity Hch of 5.6 Oe, and a saturated magnetization 4πMs of 8.3 kG. The real part of the relative permeability μ´r was about 50, which exhibited a good flat frequency dependence up to 2 GHz. The resonance frequency was higher than 3 GHz. It was found that the heteroamorphous films had soft magnetic properties with high resistivity of over 10000 μΩ · cm and high resonance frequency. The films are good candidates for core application in the gigahertz range.
Keywords :
X-ray chemical analysis; X-ray diffraction; amorphous magnetic materials; boron alloys; cobalt alloys; coercive force; electrical resistivity; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic permeability; magnetic thin films; noncrystalline structure; silicon compounds; soft magnetic materials; sputter deposition; sputtered coatings; transmission electron microscopy; (Co35.6Fe50B14.4)-(SiO2); X-ray diffraction; core application; flat frequency dependence; glass substrates; hard axis coercivity; heteroamorphous structure; high-frequency permeability; internal structure; large uniaxial anisotropy field; magnetic properties; microstructure; relative permeability; resonance frequency; saturated magnetization; soft magnetic thin films; synchronous triple-RF magnetron sputtering; transmission electron microscopy; very high electrical resistivity; volume ratio dependence; wavelength dispersive X-ray analysis; Electric resistance; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetic resonance; Permeability; Perpendicular magnetic anisotropy; Resonant frequency; Saturation magnetization; Soft magnetic materials;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2002.802424
