DocumentCode
849128
Title
Channel-length-independent hot-carrier degradation in analog p-MOS operation
Author
Thewes, R. ; Broz, Milan ; Tempel, G. ; Weber, W. ; Goser, Karl
Author_Institution
Siemens AG, Munich, Germany
Volume
13
Issue
11
fYear
1992
Firstpage
590
Lastpage
592
Abstract
The hot-carrier degradation of p-MOSFETs in analog operation is investigated. In accordance with analog operation requirements, the damage is characterized by the drain conductance and the data are taken from devices with channel lengths between 1 and 10 mu m. In the important saturation range, a strong channel-length-independent degradation of the drain conductance is found. This result is explained by a simple analytic model. Other parameters such as the drain current or the transconductance show the usual channel length dependence. These results show that an increase in channel length does not generally solve problems related with hot-carrier degradation. Furthermore, the common digital hot-carrier constraints are shown to be insufficient to cover analog applications.<>
Keywords
hot carriers; insulated gate field effect transistors; reliability; semiconductor device testing; 1 to 10 micron; analog operation; analytic model; channel lengths; drain conductance; drain current; hot-carrier degradation; p-MOSFETs; transconductance; CMOS analog integrated circuits; CMOS digital integrated circuits; CMOS process; Degradation; Extrapolation; Hot carriers; MOSFET circuits; Stress; Threshold voltage; Transconductance;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.192849
Filename
192849
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