DocumentCode :
849128
Title :
Channel-length-independent hot-carrier degradation in analog p-MOS operation
Author :
Thewes, R. ; Broz, Milan ; Tempel, G. ; Weber, W. ; Goser, Karl
Author_Institution :
Siemens AG, Munich, Germany
Volume :
13
Issue :
11
fYear :
1992
Firstpage :
590
Lastpage :
592
Abstract :
The hot-carrier degradation of p-MOSFETs in analog operation is investigated. In accordance with analog operation requirements, the damage is characterized by the drain conductance and the data are taken from devices with channel lengths between 1 and 10 mu m. In the important saturation range, a strong channel-length-independent degradation of the drain conductance is found. This result is explained by a simple analytic model. Other parameters such as the drain current or the transconductance show the usual channel length dependence. These results show that an increase in channel length does not generally solve problems related with hot-carrier degradation. Furthermore, the common digital hot-carrier constraints are shown to be insufficient to cover analog applications.<>
Keywords :
hot carriers; insulated gate field effect transistors; reliability; semiconductor device testing; 1 to 10 micron; analog operation; analytic model; channel lengths; drain conductance; drain current; hot-carrier degradation; p-MOSFETs; transconductance; CMOS analog integrated circuits; CMOS digital integrated circuits; CMOS process; Degradation; Extrapolation; Hot carriers; MOSFET circuits; Stress; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.192849
Filename :
192849
Link To Document :
بازگشت