• DocumentCode
    849128
  • Title

    Channel-length-independent hot-carrier degradation in analog p-MOS operation

  • Author

    Thewes, R. ; Broz, Milan ; Tempel, G. ; Weber, W. ; Goser, Karl

  • Author_Institution
    Siemens AG, Munich, Germany
  • Volume
    13
  • Issue
    11
  • fYear
    1992
  • Firstpage
    590
  • Lastpage
    592
  • Abstract
    The hot-carrier degradation of p-MOSFETs in analog operation is investigated. In accordance with analog operation requirements, the damage is characterized by the drain conductance and the data are taken from devices with channel lengths between 1 and 10 mu m. In the important saturation range, a strong channel-length-independent degradation of the drain conductance is found. This result is explained by a simple analytic model. Other parameters such as the drain current or the transconductance show the usual channel length dependence. These results show that an increase in channel length does not generally solve problems related with hot-carrier degradation. Furthermore, the common digital hot-carrier constraints are shown to be insufficient to cover analog applications.<>
  • Keywords
    hot carriers; insulated gate field effect transistors; reliability; semiconductor device testing; 1 to 10 micron; analog operation; analytic model; channel lengths; drain conductance; drain current; hot-carrier degradation; p-MOSFETs; transconductance; CMOS analog integrated circuits; CMOS digital integrated circuits; CMOS process; Degradation; Extrapolation; Hot carriers; MOSFET circuits; Stress; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.192849
  • Filename
    192849